魏俊俊,工学博士,副研究员。2003年毕业于北京科技大学材料科学与工程学院,获学士学位;2009年获北京科技大学材料学博士学位;2011年北京大学博士后。2011年起工作于北京科技大学新材料技术研究院。2014年至2015年,美国佐治亚理工学院交流访问。主要致力于CVD金刚石相关材料的基础科学及应用研究,涉及CVD金刚石单晶制备及加工、高品质CVD金刚石膜制备及光学应用、金刚石微纳加工技术和应用、高功率电子器件热管理材料及器件、(纳米)金刚石表面功能化修饰及其应用等方向。在Diamond Relat. Mat.,ApplTherm Eng., J Power Sources等杂志上发表学术论文80余篇,多次应邀在国内外学术会议和研究机构上做特邀报告,获得授权专利30余项。作为项目负责人先后承担国家自然科学基金、国防重大专项(子课题),以及装发预研课题等多个国家级课题。此外,还先后承担国防重点实验室基金、军工横向、校企合作等多个重要项目。作为核心骨干参与国防重大专项、国家重点研发计划、科技部国际合作(Horizon 2020)、军品配套及国防基础科研、自然科学基金等项目。参加编著国家出版基金项目纳米科学与技术丛书-《金刚石膜制备与应用》一部,获得教育部技术发明一等奖1项,北京市科技进步三等奖1项。
代表性论文
1. Z.N Qi, Y.T.Zheng, J.J. Wei*, X.G. Yu, X. Jia, J.L. Liu, L.X. Chen, C.M. Li, J.Y. Miao,C.M. Li*. Surface treatment of an applied novel all-diamond microchannel heat sink for heat transfer performance enhancement[J], Applied thermal engineering, Volume 177, August 2020, 115489.
2. Z.N Qi, Y.T.Zheng, X.H. Zhu, J.J. Wei*, J.L. Liu, L.X. Chen, C.M. Li.An ultra-thick all-diamond microchannel heat sink for single-phase heat transmission efficiency enhancement[J], Vacuum, Volume 177, July 2020, 109377.
3. X. Jia, J.J. Wei*, Y.B. Huang, et al. Enhancement of diamond seeding on aluminum nitride dielectric by electrostatic adsorption for GaN-on-diamond preparation[J]. Journal of Materials Research, 2020, 35(5): 1-8.
4. X.Jia, J.J. Wei*, Y.C. Kong, C.M. L, J.L. Liu, L.X. Chen, F.Y. Sun, X.W. Wang, The influence of dielectric layer on the thermal boundary resistance of GaN-on-diamond substrate[J], Surface and Interface Analysis, 2019, in press.
5. J.J. Wei, X.Y. Zhu, L.X. Chen, J.L. Liu, C.M. Li, High quality anti-sticking coating based on multilayer structure[J], Surface and Coatings Technology, 2019, 362:72-77.
6. X.B. Yan, J.J. Wei*, K. An, Y. Zhao, J.L. Liiu, L.X. Chen, L.F. Hei, C.M. Li, Quantitative study on graphitization and optical absorption of CVD diamond films after rapid heating treatment[J], Diamond and Related Materials,2018, in press.
7. X.B. Yan, J.J. Wei*, J.C. Guo, C.Y. Hua, L.X. Chen, L.F. Hei, C.M. Li, Mechanism of graphitization and optical degradation of CVD diamond films by rapid heating treatment[J], Diamond and Related Materials,2017, 73: 39-46.
8. J.J. Wei, J.L. Liu, L.X. Chen, L.F. Hei, F.X. Lv, C.M. Li, Amination of diamond film by ammonia microwave plasma treatment[J], Diamond and Related Materials,2015, 54(1): 34-38.
9. J.J. Wei, H. Kim, D.C. Lee, R.Z. Hu, F.X. Wu, H.L. Zhao, F. Alamgir, G. Yushin, Influence of annealing on ionic transfer and storage stability of Li2S–P2S5 solid electrolyte[J], Journal of Power source, 2015, 294: 495-500.
10. J.J. Wei, X.H. Gao, L.F. Hei, J. Askari, Ch.M. Li. Energy consumption of electro-oxidation systems with boron-doped diamond electrodes in the pulse current mode[J]. International Journal of Minerals, Metallurgy and Materials, 2013, 20(1):106-112.
11. J.J. Wei, C.M. Li, X.H. Gao, Li.F. Hei, F.X. Lv. Influence of boron dopant on formation and adhesion of diamond films on titanium substrates[J]. Applied Surface Science, 2012, 258(18):6909-6913.
12. J.J. Wei, X.P. Zhu, J.R. Ni. Electrochemical oxidation of phenol at boron-doped diamond electrode in pulse current mode[J]. ElectrochimicaActa. 2011, 56(15):5310-5315.
13. J.J. Wei, X.P Zhu, F.X. Lv, J.R. Ni. Comparative study of oxidation ability between boron-doped diamond (BDD) and lead oxide (PbO2) electrodes[J]. International Journal of Minerals, Metallurgy and Materials. 2011, 18(5): 589-593.
14. J.J. Wei, Q. He, X.P. Zhu, F.X. LV, G.Ch. Chen, J.R. Ni. Synthesis of boron doped diamond films by MWCVD and Anodic oxidation of p-Nitrophenol on Ti/BDD electrode[J]. Journal of Synthetic Crystals. 2009, 38(2): 422-425.
15. X.Y. Zhu, J.J. Wei*, L.X. Chen, J.L. Liu, L.F. Hei, C.M. Li, Y. Zhang, Anti-sticking Re-Ir coating for glass molding process[J], Thin Solid Films,2015, 584: 305-309.
16. C.Y. Hua, J.C. Guo, J.L. Liu, X.B. Yan, Y. Zhao, L.X. Chen, J.J. Wei, L.F. Hei, C.M. Li, Characterization and thermal shock behavior of Y2O3 films deposited on freestanding CVD diamond substrates[J], Applied Surface Science, 2016, 376:145-150.
17. C.Y. Hua, J.C. Guo, J.L. Liu, X.B. Yan, Y. Zhao, L.X. Chen, J.J. Wei, L.F. Hei, C.M. Li, Influence of diamond surface chemical states on the adhesion strength between Y2O3 film and diamond substrate[J], Materials and Design,2016, 105: 81-88.
18. J.L. Liu, H.M. Tian, L.X. Chen, J.J. Wei, L.F. Hei, C.M. Li, Preparation of nano-diamond films on GaN with a Si buffer layer[J], New Carbon Materials,2016, 31(5): 518-524.
19. J.C. Guo, C.M. Li, J.L. Liu, J.J. Wei, L.X. Chen, X.B. Yan, Structural evolution of Ti destroyable interlayer in large-size diamond film deposition by DC arc plasma jet[J], Applied Surface Science,2016, 370: 237-242.
20. S. Liu, J.L. Liu, C.M. Li, J.C. Guo, L.X. Chen, J.J. Wei, L.F. Hei, F.X. Lv, The mechanical enhancement of chemical vapor deposited diamond film by plasma low-pressure/high-temperature treatment[J], Carbon, 2013, 65: 365-370.
21. X.P. Zhu, J.R. Ni, J.J. Wei, X. Xing, H.N. Li, Y. Jiang, Scale-up of BDD anode system for electrochemical oxidation of phenol simulated wastewater in continuous mode[J], Journal of Hazardous Materials,2010,184(1-3): 493-498.
22. Q. He, F.X. Lv, F.L. Zhang, H.B. Guo, J.J. Wei. Particle erosion of infrared materials[J]. Journal of University of Science and Technology Beijing. 2008, 15(6): 758-763.
参编专著
《金刚石膜制备与应用》 科学出版社(978-7-03-041822-7) 2014.08
已授权专利
1. 魏俊俊,齐志娜,李成明等,一种超高热流密度散热用金刚石微通道热沉的制备方法,发明专利,ZL201810487436.6
2. 魏俊俊,贾鑫,张建军等,一种金刚石膜研磨工装,实用新型,ZL201920522529.8
3. 魏俊俊,贾鑫,李成明等,一种采用双金刚石层实现GaN原始衬底转移的方法及应用,发明专利,ZL201811340254.2
4. 魏俊俊,连洪奎,李成明等,一种金刚石微柱增强高导热石墨材料结构,实用新型,ZL201920128868.8
5. 魏俊俊,李成明,刘金龙等,一种表面P型导电金刚石热沉材料的制备方法,发明专利,ZL201510623007.3;
6. 魏俊俊,李成明,黑立富等,一种研磨抛光机的磨料自动添加装置,发明专利,ZL201310150661.8;
7. 魏俊俊,李成明,高旭辉等,一种大面积沉积金刚石膜的热丝架,实用新型专利,ZL201220201458.X;
8. 李成明,魏俊俊,黑立富等,金刚石自支撑膜-金刚石颗粒-金属复合材料的制备方法,发明专利,ZL201310231261.X;
9. 李成明,刘盛,魏俊俊等,覆盖强结合CVD金刚石的聚晶金刚石复合片的制备方法,发明专利,ZL201210385129.X